sputtering

The economy is already sputtering, with low or no growth

经济发展速度已经放慢，增长率很低，或者根本没有增长。

We were all very busy when Bill blew in with a great sputtering.

大家正在忙着,比尔气急败坏地闯了进来.

BCN thin films were grown by RF reactive sputtering.

用射频反应溅射法制备出BCN薄膜.

sputtering fireworks

噼啪作响的烟火

Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.

多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。

In a word, the structure and performance of the single cell prepared by magnetron sputtering are better than those prepared by slurry spin coating.

相比较而言，磁控溅射法制备的单电池的结构和性能优于浆料旋涂法制备的单电池。

The sputtering rate increases with the increase of the cathode voltage and the temperature.

并且随着阴极温度升高,阴极溅射率也随之增加.

A whole goat is sputtering over the fire.

一整只被烤的山羊在火上劈啪作响.

By using these targets, CeO2-TiO2 films and CeO2-TiO2/ SnO2: Sb films were deposited on soda-lime glass substrates by radio fre-quency magnetron sputtering.

以所制靶材用射频磁控溅射法在普通玻璃基片上沉积了CeO2-TiO2单层和CeO2-TiO2/SnO2：Sb双层薄膜。

Update the processing methods to make SOFC from solid electrolytical film are by chemical vapour deposition, electrophoretic deposition, flow stretching, sputtering, plasma sputter coating, etc.

目前，SOFC用固体电解质薄膜制备方法有电化学气相沉积法、化学气相沉积法、电泳沉积法、溅射法、等离子喷涂法等。

It was also found that Ag is the preferential sputtering element for the AgNi alloys.

并发现该系统Ag是择优溅射元素.

Reactive ion beam etching process is one of the ultrafine machining techniques which have been rapidly developed in recent years. Patterns on the working pieces are made by sputtering effects and chemical reaction which occur when reactive ion beam bombard the solid surface.

反应离子束刻蚀技术是近年来发展起来的一种微细加工技术，它利用反应离子束轰击团体表面时发生的溅射效应和化学反应剥离加工工作上的几何图形。

With other global engines of growth sputtering, that's not to be sneezed at.

在全球其他经济增长引擎都运转不畅的情况下, 这一承诺不容小视.

In" The Grapes of Wrath", when Tom Joad's farm in Oklahoma was repossessed he packed up his family in a sputtering truck and set off for California.

《怒火之花》中，俄克拉荷马的农场被收回后，汤姆。乔德就携上家人，坐上颠簸的卡车，动身前往加利福尼亚。

Abnormal Discharge Protection Power Supply in DC Reactive Sputtering. ( A ￣ 2K)

DC反应溅射时防止异常放电的电源（A~2K）

A new method, which synthesizes tantalum film by a sputtering cathode , has been introduced.

介绍了一种新型的在钢铁基体上制备钽薄膜的方法.

The economy is already sputtering, with low or no growth...

经济发展速度已经放慢，增长率很低，或者根本没有增长。

Reactive magnetic sputtering ( RMS ) is widely used in optical coating preparation.

反应 磁控溅射 广泛应用于制备光学薄膜.

Growth of TiN by Plasma Glow Discharge Sputtering, Diffusion and Ion Surface Alloying

等离子体辉光溅射反应复合渗镀合成TiN的研究

Morgenes went back to his painting, sputtering quietly to himself.

Morgenes又开始画起来, 自言自语.

Technical manuals of a company: glass-sandblasting machine. Glass Sputtering Plant maintenance.

某公司技术操作手册: 玻璃喷砂机.

ZnO films can be deposited by a variety of deposition techniques. Magnetron sputtering, metal-organic chemical vapor deposition, pulsed laser deposition, molecular beam epitaxy and reactive e-beam evaporation are main methods for the preparation of high-quality ZnO films with strong c-axis orientation.

在已开发的众多生长技术中，磁控溅射、金属有机物气相沉积、脉冲激光沉积、分子束外延、电子束反应蒸镀法是生长出高度c轴择优取向优质薄膜的主要方法。

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

The Resistivity of Sputtering Conducting Thin Film Affected by Bias Voltage of Base and Reaction Gas Partial Pressure

基体偏压和反应气体分压强对溅射导电膜电阻率的影响

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

The results showed that reducing appropriately the oxygen/ argon ratio in the sputtering process and the presence of oxygen in the testing process can improve the light-dark current ratio and the detector response time.

结果表明：溅射过程中适当的降低氩氧比以及测试环境中氧气氛的存在都有助于提高探测器的光暗电流比，但同时探测器的响应时间有所增大。

The design of a DC sputtering power source was presented.

介绍一种大功率直流溅射恒流电源的设计.

ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.

采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。

Deposition rate is increase quickly with sputtering power.

结果表明溅射功率对沉积速率的影响最大,随溅射功率的增大沉积速率快速增大.