sputtering的例句大全

It was also found that Ag is the preferential sputtering element for the AgNi alloys.

并发现该系统Ag是择优溅射元素.

Metal aluminum films were deposited on AAO templates by radio frequency magnetron sputtering.

用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜.

AAM offers 99.95 % ~99.995 % pure Ta sputtering Target for data storage and other thin film applications.

中精伦为数据存储和半导体行业提供高纯钽靶,产品纯度在99.95%-99.995%.

Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

For binary target, it is shown that the preferential sputtering is independent of atomic radius.

在双元靶严格解的基础上, 证明了泽优溅射与原子的半径大小无关.

Depth crystalline evolution property for microcrystalline Si films deposited by ion beam sputtering was studied.

研究了离子束溅射制备微晶硅薄膜的生长纵向结晶演化过程.

Suddenly, the car started chugging and sputtering until finally the engine quit altogether.

忽然, 车子先是发出嘎嚓声,然后又是劈啪声,终于发动机彻底歇工了.

A new method, which synthesizes tantalum film by a sputtering cathode , has been introduced.

介绍了一种新型的在钢铁基体上制备钽薄膜的方法.

The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.

介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法.

Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

Ion sputtering yields on T ? Ti target are numerically calculated with TRIM program.

应用trim程序模拟了离子在氚钛靶上的溅射产额.

Technical manuals of a company: glass-sandblasting machine. Glass Sputtering Plant maintenance.

某公司技术操作手册: 玻璃喷砂机.

In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.

用磁控溅射低温沉积镀膜技术制做锰铜薄膜,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性.

With other global engines of growth sputtering, that's not to be sneezed at.

在全球其他经济增长引擎都运转不畅的情况下, 这一承诺不容小视.