光带图形(测唱机速度用),反光图案,光学图形
Reactive ion beam etching technique has been effectively used to study and fabricate large-scale and ultra large scale integrated circuit, acoustic surface wave device, magnetic bubble device microwave device, integrated optical circuit, superconducting device, shimmer optical pattern etc.
反应离子束刻蚀技术已有效地用于研究和制造大规模和超大规模集成电路,声表面波器件,磁泡存储器,微波器件,集成光路,超导器件,闪烁光栅等。
By using the computer simulation technique, the theoretical error inthe photodetection process of an optical pattern is correcting.
利用计算机仿真技术对光学图样光电探测过程中存在的原理误差进行修正。
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